Microelectronics
CMP
In the CMP process, precise filtration is essential for effectively purging contaminants, including sub-micron-sized particles, from the slurry employed in wafer polishing. It is crucial that the filtration system consistently eradicates these contaminants to guarantee the final product's quality and yield. JEG depth and microfiber pleated filters are meticulously designed to thwart excessive pressure drops that might impact the slurry flow rate, potentially impeding the polishing process.
Wet Etch
Wet etching plays a crucial role in microelectronics and semiconductor manufacturing by selectively removing material from the substrate to form precise patterns and structures. The JEG electronics filter series is integral in eliminating impurities, particles, and contaminants from the etching solution, safeguarding the substrate surface from damage. Engineered for a steady flow rate and pressure, our filters guarantee the optimal performance of the etching solution throughout the filtration process.
Cleaning
The specific filtration requirements for cleaning solutions used in microelectronics manufacturing may vary depending on the type of cleaning process and the contaminants present. In general, the filtration systems used in this application should be able to remove particles down to sub-micron levels, and in some cases, nanometre levels. JEG offers a high-quality membrane filter that can remove particles of a specific size and can be selected based on the required level of filtration.
Plating
In the plating process, achieving the desired level of cleanliness and contamination control hinges on high purity and consistent filtration performance. The plating solution, containing metal ions and various chemicals, requires thorough filtration to eliminate impurities that could adversely affect both the plating process and the ultimate quality of the product. Our combination of JEG pre-filters, depth filters, and membrane filters excels in removing unwanted particles, demonstrating resilience in harsh chemical environments while maintaining optimal filtration performance over time.
Photolithography
In photolithography, achieving the desired level of cleanliness relies on high-quality filtration to ensure the purity of resist and developer chemicals crucial to the process. JEG membrane filters excel in removing contaminants such as particles and microorganisms down to the submicron level, as well as other impurities that could compromise the final product's quality. The use of JEG's superior filters in photolithography not only guarantees consistent filter performance but is also essential for maintaining optimal purity, minimizing downtime, and mitigating the risks of defects or failures in the production process.